Invention Grant
- Patent Title: Plasma reactor for processing gas
-
Application No.: US16752689Application Date: 2020-01-26
-
Publication No.: US10832893B2Publication Date: 2020-11-10
- Inventor: Stefan Andrew McClelland , George Stephen Leonard, III , Jae Mo Koo
- Applicant: ReCarbon, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: RECARBON, INC.
- Current Assignee: RECARBON, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patent Office of Chung Park
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
The present invention provides a plasma generating system that includes: a waveguide for transmitting a microwave energy therethrough; an inner wall disposed within the waveguide to define a plasma cavity, wherein a plasma is generated within the plasma cavity using the microwave energy; a first gas inlet mounted on a first side of the waveguide and configured to introduce a first gas into the plasma cavity and generate a first vortex flow within the plasma cavity using the first gas, the first gas inlet having a through hole through which a gas processed by the plasma exits the plasma cavity; and a plasma stabilizer having a shape of a circular hollow cylinder and installed on a second side of the waveguide, an axial direction of the plasma stabilizer being in parallel to a rotational axis of the first vortex flow.
Public/Granted literature
- US20200312627A1 PLASMA REACTOR FOR PROCESSING GAS Public/Granted day:2020-10-01
Information query