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    PLASMA REACTORS HAVING RECUPERATORS
    1.
    发明申请
    PLASMA REACTORS HAVING RECUPERATORS 审中-公开

    公开(公告)号：US20200312638A1

    公开(公告)日：2020-10-01

    申请号：US16805670

    申请日：2020-02-28

    申请人： ReCarbon, Inc.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  Jae Mo Koo

    IPC分类号： H01J37/32

    摘要： A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.

    PROOF OF WORK FOR CARBON REDUCTION/RECLAMATION
    2.
    发明公开
    PROOF OF WORK FOR CARBON REDUCTION/RECLAMATION 审中-公开

    公开(公告)号：US20240142419A1

    公开(公告)日：2024-05-02

    申请号：US18494728

    申请日：2023-10-25

    申请人： RECARBON, INC.

    发明人： John Kirt Liu ,  Jae Mo Koo

    IPC分类号： G01N33/00 ,  G01D4/00 ,  G01D21/02

    CPC分类号： G01N33/0014 ,  G01D4/008 ,  G01D21/02 ,  G01N33/004

    摘要： A token adjustment system may include a carbon conversion device operable to generate a syngas from a greenhouse gas and a processing device. The processing device may be operable to receive one or more measurements. The one or more measurements may include one or more of an input flow measurement received from an input flow sensor, an output flow measurement received from an output flow sensor, or a utility measurement received from a utility sensor. The processing device may be operable to compute a carbon balance, a carbon intensity, or a carbon adjustment based on the one or more measurements. The processing device may be operable to cause a token to be generated or consumed based on the carbon balance, the carbon intensity, or the carbon adjustment.

    DURABLE AUTO-IGNITION DEVICE FOR PLASMA REACTOR
    4.
    发明申请
    DURABLE AUTO-IGNITION DEVICE FOR PLASMA REACTOR 审中-公开

    公开(公告)号：US20200306716A1

    公开(公告)日：2020-10-01

    申请号：US16805661

    申请日：2020-02-28

    申请人： ReCarbon, Inc.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  Curtis Peter Tom

    IPC分类号： B01J19/12 ,  H05H1/46

    摘要： The present invention provides a plasma generating system that includes: a plasma cavity for generating a plasma therewithin by use of microwave energy; an adaptor electrically grounded and having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and an ignition device mounted on the adaptor. The ignition device includes: a first electrode electrically grounded; and a second electrode electrically floating and configured to convert a portion of the microwave energy into an electrostatic discharge to thereby develop a voltage difference between the first and second electrodes, where the voltage difference generates a spark discharge between the first electrode and the second electrode to create the plasma.

    SYSTEMS FOR CONTROLLING PLASMA REACTORS
    6.
    发明申请
    SYSTEMS FOR CONTROLLING PLASMA REACTORS 审中-公开

    公开(公告)号：US20200314994A1

    公开(公告)日：2020-10-01

    申请号：US16813748

    申请日：2020-03-10

    申请人： ReCarbon, Inc.

    发明人： Curtis Peter Tom ,  Fei Xie ,  Wei Li

    IPC分类号： H05H1/46

    摘要： The present invention provides a plasma generating system that includes: a programmable logic controller (PLC) and a plurality of reactor systems coupled to the PLC by a daisy chain network. Each of the plurality of reactor systems include: a microwave generator for generating microwave energy; and a power supply for providing electrical power to the microwave generator and including a controller, where the controller comprises: at least one microprocessor; and a module communicatively coupled to the at least one processor and including at least one of digital input-output (DIO) and analogue input-output (AIO).

    Plasma generating system having movable electrodes
    7.
    发明授权
    Plasma generating system having movable electrodes 有权

    公开(公告)号：US09699880B2

    公开(公告)日：2017-07-04

    申请号：US14833930

    申请日：2015-08-24

    申请人： ReCarbon, Inc.

    发明人： Sang Hun Lee ,  Toru Tanibata ,  Orion Weihe

    IPC分类号： B23K10/00 ,  H05H1/48 ,  H05H1/46

    CPC分类号： H05H1/48 ,  B23K10/00 ,  H05H1/46 ,  H05H2001/4622

    摘要： A plasma generating system is provided. The plasma generating system includes: a pair of electrodes having distal ends; an electrode holder holding the pair of electrodes; a gate having a surface on which the electrode holder is slidably mounted and adapted to be controlled by sliding the electrode holder on the surface; and a resilient member secured to the gate and adapted to generate a force to close the opening. The distal ends are adapted to move into an opening of the gate as the electrode holder slides along a direction on the surface and adapted to generate an electric arc to thereby ignite plasma in a gas.

    PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER
    10.
    发明申请
    PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER 有权

    公开(公告)号：US20220293400A1

    公开(公告)日：2022-09-15

    申请号：US17654577

    申请日：2022-03-11

    申请人： RECARBON, INC.

    发明人： George Stephen Leonard, III ,  Stefan Andrew McClelland ,  John Joseph Rehagen ,  Jae Mo Koo

    IPC分类号： H01J37/32

    摘要： A plasma reaction system may include a plasma chamber and an ancillary reaction chamber. The plasma chamber may include a plasma chamber inlet for introducing reactant gases into the plasma chamber, plasma chamber walls that form an interior space in which chemical reactions between the reactant gases may occur, a plasma generated within the plasma chamber, a waveguide for directing energy towards the plasma generated within the plasma chamber, and a plasma chamber outlet for carrying first outlet gases from the plasma chamber. The ancillary reaction chamber may include an ancillary reaction chamber inlet configured to obtain the first outlet gases from the plasma chamber, ancillary reaction chamber walls that form an interior space of the ancillary reaction chamber in which second chemical reactions between the outlet gases may occur, and an ancillary reaction chamber outlet for carrying second outlet gases from the ancillary reaction chamber.