PLASMA REACTORS HAVING RECUPERATORS
    1.
    发明申请

    公开(公告)号:US20200312638A1

    公开(公告)日:2020-10-01

    申请号:US16805670

    申请日:2020-02-28

    申请人: ReCarbon, Inc.

    IPC分类号: H01J37/32

    摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.

    PROOF OF WORK FOR CARBON REDUCTION/RECLAMATION

    公开(公告)号:US20240142419A1

    公开(公告)日:2024-05-02

    申请号:US18494728

    申请日:2023-10-25

    申请人: RECARBON, INC.

    IPC分类号: G01N33/00 G01D4/00 G01D21/02

    摘要: A token adjustment system may include a carbon conversion device operable to generate a syngas from a greenhouse gas and a processing device. The processing device may be operable to receive one or more measurements. The one or more measurements may include one or more of an input flow measurement received from an input flow sensor, an output flow measurement received from an output flow sensor, or a utility measurement received from a utility sensor. The processing device may be operable to compute a carbon balance, a carbon intensity, or a carbon adjustment based on the one or more measurements. The processing device may be operable to cause a token to be generated or consumed based on the carbon balance, the carbon intensity, or the carbon adjustment.

    PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER

    公开(公告)号:US20220293400A1

    公开(公告)日:2022-09-15

    申请号:US17654577

    申请日:2022-03-11

    申请人: RECARBON, INC.

    IPC分类号: H01J37/32

    摘要: A plasma reaction system may include a plasma chamber and an ancillary reaction chamber. The plasma chamber may include a plasma chamber inlet for introducing reactant gases into the plasma chamber, plasma chamber walls that form an interior space in which chemical reactions between the reactant gases may occur, a plasma generated within the plasma chamber, a waveguide for directing energy towards the plasma generated within the plasma chamber, and a plasma chamber outlet for carrying first outlet gases from the plasma chamber. The ancillary reaction chamber may include an ancillary reaction chamber inlet configured to obtain the first outlet gases from the plasma chamber, ancillary reaction chamber walls that form an interior space of the ancillary reaction chamber in which second chemical reactions between the outlet gases may occur, and an ancillary reaction chamber outlet for carrying second outlet gases from the ancillary reaction chamber.

    Plasma reactor for processing gas

    公开(公告)号:US10832893B2

    公开(公告)日:2020-11-10

    申请号:US16752689

    申请日:2020-01-26

    申请人: ReCarbon, Inc.

    IPC分类号: H01J37/32

    摘要: The present invention provides a plasma generating system that includes: a waveguide for transmitting a microwave energy therethrough; an inner wall disposed within the waveguide to define a plasma cavity, wherein a plasma is generated within the plasma cavity using the microwave energy; a first gas inlet mounted on a first side of the waveguide and configured to introduce a first gas into the plasma cavity and generate a first vortex flow within the plasma cavity using the first gas, the first gas inlet having a through hole through which a gas processed by the plasma exits the plasma cavity; and a plasma stabilizer having a shape of a circular hollow cylinder and installed on a second side of the waveguide, an axial direction of the plasma stabilizer being in parallel to a rotational axis of the first vortex flow.

    Plasma reactors having recuperators

    公开(公告)号:US10854429B2

    公开(公告)日:2020-12-01

    申请号:US16805670

    申请日:2020-02-28

    申请人: ReCarbon, Inc.

    摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.

    CONTROLLING EXHAUST GAS PRESSURE OF A PLASMA REACTOR FOR PLASMA STABILITY

    公开(公告)号:US20200312629A1

    公开(公告)日:2020-10-01

    申请号:US16790644

    申请日:2020-02-13

    申请人: ReCarbon, Inc.

    IPC分类号: H01J37/32 H05H1/46

    摘要: The present invention provides a plasma generating system that includes: a plurality of plasma reactors. Each plurality of plasma reactors includes: a waveguide for transmitting a microwave energy therethrough; a plasma chamber coupled to the waveguide and configured to generate a plasma therein using the microwave energy; a gas inlet for introducing a gas into the plasma chamber; an exhaust gas pipe for carrying an exhaust gas from the plasma chamber, wherein the plasma converts the gas into the exhaust gas; and a pressure control device installed in the exhaust gas pipe and configured to control a pressure of the exhaust gas in the exhaust gas pipe. The plasma generating system also includes a manifold coupled to the exhaust gas pipes of the plurality of plasma reactors and configured to receive the exhaust gas from the exhaust gas pipes.

    THERMAL MANAGEMENT OF PLASMA REACTORS
    10.
    发明申请

    公开(公告)号:US20200312628A1

    公开(公告)日:2020-10-01

    申请号:US16803969

    申请日:2020-02-27

    申请人: ReCarbon, Inc.

    IPC分类号: H01J37/32 H05H1/46 C23C16/511

    摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor mounted on a first side of the waveguide and physically separated from the waveguide by a first gap and having a gas outlet through which a gas processed by the plasma exits the plasma cavity; and an EM seal disposed in the first gap and configured to block leakage of the microwave energy through the first gap.