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公开(公告)号:US20200312638A1
公开(公告)日:2020-10-01
申请号:US16805670
申请日:2020-02-28
申请人: ReCarbon, Inc.
IPC分类号: H01J37/32
摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.
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公开(公告)号:US20240142419A1
公开(公告)日:2024-05-02
申请号:US18494728
申请日:2023-10-25
申请人: RECARBON, INC.
发明人: John Kirt Liu , Jae Mo Koo
CPC分类号: G01N33/0014 , G01D4/008 , G01D21/02 , G01N33/004
摘要: A token adjustment system may include a carbon conversion device operable to generate a syngas from a greenhouse gas and a processing device. The processing device may be operable to receive one or more measurements. The one or more measurements may include one or more of an input flow measurement received from an input flow sensor, an output flow measurement received from an output flow sensor, or a utility measurement received from a utility sensor. The processing device may be operable to compute a carbon balance, a carbon intensity, or a carbon adjustment based on the one or more measurements. The processing device may be operable to cause a token to be generated or consumed based on the carbon balance, the carbon intensity, or the carbon adjustment.
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公开(公告)号:US20240075447A1
公开(公告)日:2024-03-07
申请号:US18463222
申请日:2023-09-07
申请人: RECARBON, INC.
发明人: Hatem Harraz , Jae Mo Koo , Hee Seon Kim
CPC分类号: B01J19/088 , B01J19/0013 , B01J19/245 , C01B3/342 , B01J2219/0004 , B01J2219/00117 , B01J2219/00132
摘要: A device may include a plasma chamber in fluid communication with an ancillary reaction chamber and an integrated reformer. The integrated reformer may be in fluid communication with the ancillary reaction chamber. The ancillary reaction chamber may be configured to utilize heat from a heated first synthesis gas stream received from the plasma chamber to initiate an exothermic reaction with a second gas stream to output a heated second synthesis gas stream to the integrated reformer.
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公开(公告)号:US20220293400A1
公开(公告)日:2022-09-15
申请号:US17654577
申请日:2022-03-11
申请人: RECARBON, INC.
IPC分类号: H01J37/32
摘要: A plasma reaction system may include a plasma chamber and an ancillary reaction chamber. The plasma chamber may include a plasma chamber inlet for introducing reactant gases into the plasma chamber, plasma chamber walls that form an interior space in which chemical reactions between the reactant gases may occur, a plasma generated within the plasma chamber, a waveguide for directing energy towards the plasma generated within the plasma chamber, and a plasma chamber outlet for carrying first outlet gases from the plasma chamber. The ancillary reaction chamber may include an ancillary reaction chamber inlet configured to obtain the first outlet gases from the plasma chamber, ancillary reaction chamber walls that form an interior space of the ancillary reaction chamber in which second chemical reactions between the outlet gases may occur, and an ancillary reaction chamber outlet for carrying second outlet gases from the ancillary reaction chamber.
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公开(公告)号:US10832893B2
公开(公告)日:2020-11-10
申请号:US16752689
申请日:2020-01-26
申请人: ReCarbon, Inc.
IPC分类号: H01J37/32
摘要: The present invention provides a plasma generating system that includes: a waveguide for transmitting a microwave energy therethrough; an inner wall disposed within the waveguide to define a plasma cavity, wherein a plasma is generated within the plasma cavity using the microwave energy; a first gas inlet mounted on a first side of the waveguide and configured to introduce a first gas into the plasma cavity and generate a first vortex flow within the plasma cavity using the first gas, the first gas inlet having a through hole through which a gas processed by the plasma exits the plasma cavity; and a plasma stabilizer having a shape of a circular hollow cylinder and installed on a second side of the waveguide, an axial direction of the plasma stabilizer being in parallel to a rotational axis of the first vortex flow.
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公开(公告)号:US20230226515A1
公开(公告)日:2023-07-20
申请号:US18154779
申请日:2023-01-13
申请人: RECARBON, INC.
发明人: Hatem Harraz , Jae Mo Koo
CPC分类号: B01J19/245 , B01J19/0013 , B01J19/088 , C01B3/26 , C01B3/382 , B01J2219/00092 , B01J2219/0869 , B01J2219/0871 , B01J2219/0894 , C01B2203/0233 , C01B2203/0238 , C01B2203/0277 , C01B2203/0883 , C01B2203/1241
摘要: An integrated reformer includes an outer chamber, a first inlet, a second inlet, and a cooling unit associated with the outer chamber. The first inlet is configured to obtain a first gas stream into a first space in the outer chamber. The second inlet is configured to obtain a second gas stream into the first space in the outer chamber. The cooling unit is configured to absorb thermal energy from the first gas stream.
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公开(公告)号:US10854429B2
公开(公告)日:2020-12-01
申请号:US16805670
申请日:2020-02-28
申请人: ReCarbon, Inc.
摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor having a gas outlet through which an exhaust gas processed by the plasma exits the plasma cavity; and a recuperator directly attached to the adaptor and having a gas passageway that is in fluid communication with the gas outlet in the adaptor. The recuperator recovers heat energy from the exhaust gas and heats an input gas using the heat energy.
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公开(公告)号:US10832894B2
公开(公告)日:2020-11-10
申请号:US16803969
申请日:2020-02-27
申请人: ReCarbon, Inc.
IPC分类号: H01J7/24 , H01J37/32 , C23C16/511 , H05H1/46
摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor mounted on a first side of the waveguide and physically separated from the waveguide by a first gap and having a gas outlet through which a gas processed by the plasma exits the plasma cavity; and an EM seal disposed in the first gap and configured to block leakage of the microwave energy through the first gap.
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公开(公告)号:US20200312629A1
公开(公告)日:2020-10-01
申请号:US16790644
申请日:2020-02-13
申请人: ReCarbon, Inc.
发明人: George Stephen Leonard, III , Stefan Andrew McClelland , Fei Xie , Wei Li , Curtis Peter Tom , Jae Mo Koo
摘要: The present invention provides a plasma generating system that includes: a plurality of plasma reactors. Each plurality of plasma reactors includes: a waveguide for transmitting a microwave energy therethrough; a plasma chamber coupled to the waveguide and configured to generate a plasma therein using the microwave energy; a gas inlet for introducing a gas into the plasma chamber; an exhaust gas pipe for carrying an exhaust gas from the plasma chamber, wherein the plasma converts the gas into the exhaust gas; and a pressure control device installed in the exhaust gas pipe and configured to control a pressure of the exhaust gas in the exhaust gas pipe. The plasma generating system also includes a manifold coupled to the exhaust gas pipes of the plurality of plasma reactors and configured to receive the exhaust gas from the exhaust gas pipes.
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公开(公告)号:US20200312628A1
公开(公告)日:2020-10-01
申请号:US16803969
申请日:2020-02-27
申请人: ReCarbon, Inc.
IPC分类号: H01J37/32 , H05H1/46 , C23C16/511
摘要: A plasma generating system includes a waveguide for transmitting a microwave energy therethrough and an inner wall disposed within the waveguide to define a plasma cavity, where a plasma is generated within the plasma cavity using the microwave energy. The plasma generating system further includes: an adaptor mounted on a first side of the waveguide and physically separated from the waveguide by a first gap and having a gas outlet through which a gas processed by the plasma exits the plasma cavity; and an EM seal disposed in the first gap and configured to block leakage of the microwave energy through the first gap.
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