- 专利标题： Method and device for exposure of photosensitive layer
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申请号： US16464838申请日： 2016-12-20
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公开(公告)号： US10852528B2公开(公告)日： 2020-12-01
- 发明人: Bernhard Thallner , Boris Povazay
- 申请人： EV Group E. Thallner GmbH
- 申请人地址： AT St. Florian am Inn
- 专利权人： EV Group E. Thallner GmbH
- 当前专利权人： EV Group E. Thallner GmbH
- 当前专利权人地址： AT St. Florian am Inn
- 代理机构： Kusner & Jaffe
- 国际申请： PCT/EP2016/081888 WO 20161220
- 国际公布： WO2018/113918 WO 20180628
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/213 ; G02B26/08
摘要：
A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.
公开/授权文献
- US20190293924A1 METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER 公开/授权日：2019-09-26
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