-
公开(公告)号：US20190293924A1
公开(公告)日：2019-09-26
申请号：US16464838
申请日：2016-12-20
发明人： Bernhard Thallner , Boris Povazay
摘要： A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.
-
公开(公告)号：US11681228B2
公开(公告)日：2023-06-20
申请号：US16973578
申请日：2018-06-19
发明人： Bernhard Thallner , Boris Povazay
CPC分类号： G03F7/704 , G03F7/2051 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70466 , G03F7/70558
摘要： A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.
-
公开(公告)号：US20190025194A1
公开(公告)日：2019-01-24
申请号：US16068386
申请日：2016-02-17
发明人： Martin Eibelhuber , Markus Heilig , Boris Povazay
摘要： A metrology device and method for inspecting a substrate stack. The device includes sound application means for applying sound waves to a first substrate stack surface of the substrate stack, an optical system having a source for outputting electromagnetic radiation, which are split into at least one first beam path and one second beam path, means for loading a substrate stack measuring surface of the substrate stack, with the first beam path, interference means for forming an interference radiation made up of the first and second beam paths, a detector for detecting the interference radiation, and analysing means for analysing the interference radiation detected at the detector.
-
公开(公告)号：US11865824B2
公开(公告)日：2024-01-09
申请号：US17919771
申请日：2020-04-20
CPC分类号： B32B37/025 , C23C14/0005 , C23C14/0605 , C23C16/01 , C23C16/26
摘要： The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.
-
公开(公告)号：US20230211592A1
公开(公告)日：2023-07-06
申请号：US17919771
申请日：2020-04-20
CPC分类号： B32B37/025 , C23C14/0005 , C23C14/0605 , C23C16/01 , C23C16/26
摘要： The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.
-
公开(公告)号：US11040525B2
公开(公告)日：2021-06-22
申请号：US16463092
申请日：2017-10-23
发明人： Jozsef Krol , Boris Povazay
摘要： A method and apparatus for embossing micro-structures and/or nano-structures. The method includes the steps of providing a structured embossing roll having end faces; coupling a crosslinking radiation into the structured embossing roll which is transparent for the crosslinking radiation, wherein the embossing roll functions as a light guide for the coupled in crosslinking radiation; providing a carrier having an embossing compound applied thereto; contacting the embossing roll with the embossing compound; coupling the crosslinking radiation out of the embossing roll; and curing the embossing compound which has been acted upon by the coupled out crosslinking radiation via the embossing roll.
-
公开(公告)号：US10656078B2
公开(公告)日：2020-05-19
申请号：US16068386
申请日：2016-02-17
发明人： Martin Eibelhuber , Markus Heilig , Boris Povazay
摘要： A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.
-
公开(公告)号：US12025426B2
公开(公告)日：2024-07-02
申请号：US17421267
申请日：2019-01-18
发明人： Dominik Zinner , Jürgen Mallinger , Thomas Plach , Boris Povazay , Harald Rohringer , Jürgen Markus Süss
CPC分类号： G01B11/14 , G01B11/16 , H01L21/67288 , H01L22/12
摘要： A measuring device for determining a course of a bonding wave in a gap between a first substrate and a second substrate, and a method for determining a course of a bonding wave in a gap between a first substrate and a second substrate.
-
公开(公告)号：US20230395418A1
公开(公告)日：2023-12-07
申请号：US18033896
申请日：2021-03-30
IPC分类号： H01L21/683 , H01L21/02 , H01L21/78 , H01L33/00
CPC分类号： H01L21/6835 , H01L21/02002 , H01L21/7806 , H01L33/0095 , H01L2221/68363 , H01L2221/68368 , H01L2221/68381
摘要： A method and a device for the separation of structures from a substrate. Furthermore, the invention relates to a method and a device for transferring structures from a first substrate to a second substrate.
-
公开(公告)号：US20200089121A1
公开(公告)日：2020-03-19
申请号：US16470709
申请日：2016-12-20
发明人： Bernhard Thallner , Boris Povazay
IPC分类号： G03F7/20
摘要： A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.
-
-
-
-
-
-
-
-
-
搜索结果
18 条记录 (耗时 0.015 秒)
