Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15824422Application Date: 2017-11-28
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Publication No.: US10854588B2Publication Date: 2020-12-01
- Inventor: Hisashi Toyoda , Koichi Yamazaki , Koichi Arai , Tatsuhiro Seki
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2015-087671 20150422
- Main IPC: H01L25/18
- IPC: H01L25/18 ; H03K17/10 ; H03K17/687 ; H03K17/74 ; H01L23/00 ; H01L25/07 ; H01L29/10 ; H02P27/06

Abstract:
A semiconductor device includes a normally-on junction FET having a first gate electrode, a first source electrode and a first drain electrode, a normally-off MOSFET having a second gate electrode, a second source electrode and a second drain electrode, and a voltage applying unit which applies a voltage to the first gate electrode. The first source electrode of the junction FET is electrically connected to the second drain electrode of the MOSFET, and the junction FET is thus connected to the MOSFET in series, and the voltage applying unit applies a second voltage with a polarity opposite to that of a first voltage applied to the first gate electrode when the junction FET is brought into an off-state, to the first gate electrode when the MOSFET is in an on-state.
Public/Granted literature
- US20180082991A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-03-22
Information query
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