Invention Grant
- Patent Title: Plasma treatment on metal-oxide TFT
-
Application No.: US15874081Application Date: 2018-01-18
-
Publication No.: US10854737B2Publication Date: 2020-12-01
- Inventor: Soo Young Choi , Beom Soo Park , Yi Cui , Tae Kyung Won , Dong-Kil Yim
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L23/31
- IPC: H01L23/31 ; H01L21/02 ; H01L29/66 ; H01L29/786
Abstract:
Techniques are disclosed for methods of post-treating an etch stop or a passivation layer in a thin film transistor to increase the stability behavior of the thin film transistor.
Public/Granted literature
- US20180145157A1 PLASMA TREATMENT ON METAL-OXIDE TFT Public/Granted day:2018-05-24
Information query
IPC分类:
