Invention Grant
- Patent Title: Systems and methods of modulating flow during vapor jet deposition of organic materials
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Application No.: US14730768Application Date: 2015-06-04
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Publication No.: US10858729B2Publication Date: 2020-12-08
- Inventor: Gregory McGraw , William E. Quinn , Matthew King , Elliot H. Hartford, Jr. , Siddharth Harikrishna Mohan , Benjamin Swedlove , Gregg Kottas
- Applicant: Universal Display Corporation
- Applicant Address: US NJ Ewing
- Assignee: Universal Display Corporation
- Current Assignee: Universal Display Corporation
- Current Assignee Address: US NJ Ewing
- Agency: Butzel Long
- Main IPC: C23C14/12
- IPC: C23C14/12 ; C23C14/54 ; C23C14/22 ; B41J2/045 ; C23C14/04 ; H01L51/56 ; H01L51/00 ; B05D1/00

Abstract:
Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
Public/Granted literature
- US11220737B2 Systems and methods of modulating flow during vapor jet deposition of organic materials Public/Granted day:2022-01-11
Information query
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