Invention Grant
- Patent Title: Electrostatic chuck device
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Application No.: US15556556Application Date: 2016-02-04
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Publication No.: US10861730B2Publication Date: 2020-12-08
- Inventor: Hironori Kugimoto
- Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Merchant & Gould P.C.
- Priority: JP2015-049463 20150312
- International Application: PCT/JP2016/053386 WO 20160204
- International Announcement: WO2016/143427 WO 20160915
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; H01L21/67

Abstract:
An object is to provide an electrostatic chuck device having high heat resistance, which can be used even under high-temperature environment. An electrostatic chuck device includes: an electrostatic chuck section having a placing surface for placing a plate-shaped sample on one main surface thereof and an electrode for electrostatic adsorption; a temperature-controlling base section which is provided on the other side of the electrostatic chuck section in relation to the placing surface to cool the electrostatic chuck section; a heater element which is provided in a form of a layer between the electrostatic chuck section and the temperature-controlling base section; and a first adhesive layer which is provided between the heater element and the electrostatic chuck section to adhere the heater element and the electrostatic chuck section to each other, in which the first adhesive layer is made of inorganic glass or an inorganic material having a partially crystallized glass structure.
Public/Granted literature
- US20180053678A1 ELECTROSTATIC CHUCK DEVICE Public/Granted day:2018-02-22
Information query
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