Mask frame assembly including pattern position adjusting mechanism and pattern position adjusting method using the mask frame assembly
Abstract:
A mask frame assembly includes: a mask including a deposition pattern through which a deposition material is deposited to a deposition target; a frame to which the mask comprising the deposition pattern is combined; and a pattern position adjusting mechanism which is coupled to the frame and configured to apply a force to the frame such that a position of the deposition pattern of the mask combined to the frame is changed.
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