Invention Grant
- Patent Title: Reflective mask blank, reflective mask, and process for producing reflective mask blank
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Application No.: US16131560Application Date: 2018-09-14
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Publication No.: US10890842B2Publication Date: 2021-01-12
- Inventor: Hiroyoshi Tanabe
- Applicant: AGC INC.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC INC.
- Current Assignee: AGC INC.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Obion, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-181785 20170921,JP2018-112600 20180613
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/54
Abstract:
A reflective mask blank includes, on/above a substrate in the following order from the substrate side, a reflective layer which reflects EUV light, and an absorber layer which absorbs EUV light. The absorber layer contains Sn as a main component and Ta in an amount of 25 at % or more.
Public/Granted literature
- US20190086791A1 REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PROCESS FOR PRODUCING REFLECTIVE MASK BLANK Public/Granted day:2019-03-21
Information query
