Invention Grant
- Patent Title: Robust ion source
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Application No.: US16713713Application Date: 2019-12-13
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Publication No.: US10892153B2Publication Date: 2021-01-12
- Inventor: James E. Blessing , Jonathan Leslie , Jonathan Hugh Batey
- Applicant: MKS Instruments, Inc.
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Hamilton, Brook, Smith & Reynolds, P.C.
- Main IPC: H01J49/14
- IPC: H01J49/14 ; H01J49/08

Abstract:
Apparatus (e.g., ion source), systems (e.g., residual gas analyzer), and methods provide extended life and improved analytical stability of mass spectrometers in the presence of contamination gases while achieving substantial preferential ionization of sampled gases over internal background gases. One embodiment is an ion source that includes a gas source, nozzle, electron source, and electrodes. The gas source delivers gas via the nozzle to an evacuated ionization volume and is at a higher pressure than that of the evacuated ionization volume. Gas passing through the nozzle freely expands in an ionization region of the ionization volume. The electron source emits electrons through the expanding gas in the ionization region to ionize at least a portion of the expanding gas. The electrodes create electrical fields for ion flow from the ionization region to a mass filter and are located at distances from the nozzle and oriented to limit their exposure to the gas.
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