Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16598832Application Date: 2019-10-10
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Publication No.: US10896980B2Publication Date: 2021-01-19
- Inventor: Yasuhiro Okamoto , Nobuo Machida , Kenichi Hisada
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2018-214459 20181115
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/66 ; H01L29/06 ; H01L29/08 ; H01L29/417 ; H01L29/16 ; H01L29/47

Abstract:
In a Schottky barrier diode region, a Schottky barrier diode is formed between an n-type drift layer and a metal layer, and in a body diode region, a p-type semiconductor region, a p-type semiconductor region, and a p-type semiconductor region are formed in order from a main surface side in the drift layer, and a body diode is formed between the p-type semiconductor region and the drift layer. An impurity concentration of the p-type semiconductor region is decreased lower than the impurity concentration of the p-type semiconductor regions, thereby increasing the reflux current flowing through the Schottky barrier diode and preventing the reflux current from flowing through the body diode.
Public/Granted literature
- US20200161480A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-05-21
Information query
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