发明授权
- 专利标题: Aminosilane-modified colloidal silica dispersion and method of manufacturing same
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申请号: US15569652申请日: 2016-05-11
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公开(公告)号: US10899893B2公开(公告)日: 2021-01-26
- 发明人: Natsumi Murakami , Masahiro Hida , Norio Tsubokawa , Takeshi Yamauchi , Tomoya Maeta
- 申请人: NISSAN CHEMICAL INDUSTRIES, LTD. , NIIGATA UNIVERSITY
- 申请人地址: JP Tokyo; JP Niigata
- 专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.,NIIGATA UNIVERSITY
- 当前专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.,NIIGATA UNIVERSITY
- 当前专利权人地址: JP Tokyo; JP Niigata
- 代理机构: Oliff PLC
- 优先权: JP2015-096914 20150511
- 国际申请: PCT/JP2016/064027 WO 20160511
- 国际公布: WO2016/181997 WO 20161117
- 主分类号: C01B33/14
- IPC分类号: C01B33/14 ; C08G81/02 ; C01B33/145 ; C08F292/00 ; C09C1/30
摘要:
The aminosilane-modified colloidal silica dispersion contains colloidal silica particles having surfaces to which there are bound a first silyl group represented by the following formula (1): R1aSi(OR2)3-aO— and a second silyl group represented by the following formula (2): R3bSi(OR4)3-bO— and, as a dispersion medium, a mixed solvent formed of a polar solvent S1 having a dielectric constant at 20° C. of 15 or higher and lower than 60 and a non-polar solvent S2 having a dielectric constant at 20° C. of 1 or higher and lower than 15, at a mass ratio (S1/S2) of 0.3 to 6.
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