- 专利标题: Semiconductor device and method for manufacturing the same
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申请号: US16561501申请日: 2019-09-05
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公开(公告)号: US10910359B2公开(公告)日: 2021-02-02
- 发明人: Naoki Okuno , Kosei Nei , Hiroaki Honda , Naoto Yamade , Hiroshi Fujiki
- 申请人: Semiconductor Energy Laboratory Co., Ltd.
- 申请人地址: JP Atsugi
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi
- 代理机构: Robinson Intellectual Property Law Office
- 代理商 Eric J. Robinson
- 优先权: JP2016-202389 20161014
- 主分类号: H01L27/02
- IPC分类号: H01L27/02 ; H01L27/11521 ; H01L27/11519 ; H01L27/11565 ; H01L29/786
摘要:
A transistor includes a first insulator over a substrate; a first oxide thereover; a second oxide in contact with at least part of the top surface of the first oxide; a first conductor and a second conductor each in contact with at least part of the top surface of the second oxide; a third oxide that is over the first conductor and the second conductor and is in contact with at least part of the top surface of the second oxide; a second insulator thereover; a third conductor which is over the second insulator and at least part of which overlaps with a region between the first conductor and the second conductor; and a third insulator which is over the third conductor and at least part of which is in contact with the top surface of the first insulator. The thickness of a region of the first insulator that is in contact with the third insulator is less than the thickness of a region of the first insulator that is in contact with the first oxide.
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