- 专利标题： Array substrate, method for fabricating the same and display device
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申请号： US14772876申请日： 2014-11-21
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公开(公告)号： US10910498B2公开(公告)日： 2021-02-02
- 发明人: Zhanfeng Cao , Feng Zhang , Qi Yao
- 申请人： BOE Technology Group Co., Ltd.
- 申请人地址： CN Beijing
- 专利权人： BOE Technology Group Co., Ltd.
- 当前专利权人： BOE Technology Group Co., Ltd.
- 当前专利权人地址： CN Beijing
- 代理机构： Banner & Witcoff, Ltd.
- 优先权： CN201410373777 20140731
- 国际申请： PCT/CN2014/091906 WO 20141121
- 国际公布： WO2016/015415 WO 20160204
- 主分类号： H01L29/786
- IPC分类号： H01L29/786 ; H01L27/12 ; H01L29/423 ; H01L29/45 ; H01L29/49 ; H01L29/66 ; H01L21/311 ; H01L21/3105 ; H01L21/027
摘要：
An array substrate, a method for fabricating the same and a display device are disclosed. The method for fabricating the array substrate includes: forming a pattern of a gate electrode, a pattern of a gate insulation layer and a pattern of a metal oxide semiconductor active layer on a base substrate; forming an etch stop layer; forming a pattern of a pixel electrode first, and then forming a pattern of a source electrode and a pattern of a drain electrode; wherein the pattern of the pixel electrode is connected to the pattern of the metal oxide semiconductor active layer through the pattern of the source electrode or the pattern of the drain electrode. The method can prevent the problem that the pattern of the pixel electrode failing to connect to the pattern of the source electrode or the pattern of the drain electrode.
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