Invention Grant
- Patent Title: Secondary amine, radical, and alkoxy amine compound
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Application No.: US16262667Application Date: 2019-01-30
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Publication No.: US10913812B2Publication Date: 2021-02-09
- Inventor: Meng-Wei Wang , Yu-Min Han , Chih-Hsiang Lin
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW107137351A 20181023
- Main IPC: C08F293/00
- IPC: C08F293/00 ; C07F9/6574

Abstract:
An alkoxy amine compound is provided, which has a chemical structure of: wherein each of R1 is independently H, C1-6 alkyl group, or C1-6 alkoxy group; R2 is C1-6 alkyl group, R3 is —(CxH2x)—OH or —(CxH2x+1), and x is 1 to 8; R4 is H or C1-6 alkyl group; R5 is and R6 is H or C1-8 alkyl group; R7 is H or C1-6 alkyl group, R8 is Ini is a residual group of a radical initiator; and n is an integer of 1 to 10000.
Public/Granted literature
- US20200079889A1 SECONDARY AMINE, RADICAL, AND ALKOXY AMINE COMPOUND Public/Granted day:2020-03-12
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