Invention Grant
- Patent Title: Block copolymers with high flory-huggins interaction parameters for block copolymer lithography
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Application No.: US15404775Application Date: 2017-01-12
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Publication No.: US10913873B2Publication Date: 2021-02-09
- Inventor: Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
- Applicant: Wisconsin Alumni Research Foundation
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WI Madison
- Agency: Bell & Manning, LLC
- Agent Michelle Manning
- Main IPC: C09D153/00
- IPC: C09D153/00 ; C08F297/02 ; C08F12/22 ; C08F12/32 ; G03F7/00 ; C08F297/04 ; C09D153/02
Abstract:
Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
Public/Granted literature
- US20170121555A1 BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY Public/Granted day:2017-05-04
Information query
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