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1.发明授权公开(公告)号：US10913873B2
公开(公告)日：2021-02-09
申请号：US15404775
申请日：2017-01-12
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
IPC: C09D153/00 , C08F297/02 , C08F12/22 , C08F12/32 , G03F7/00 , C08F297/04 , C09D153/02
Abstract: Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
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2.发明申请公开(公告)号：US20170121555A1
公开(公告)日：2017-05-04
申请号：US15404775
申请日：2017-01-12
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
IPC: C09D153/00 , G03F7/00 , C09D153/02 , C08F297/02 , C08F297/04
CPC classification number: C09D153/00 , C08F12/22 , C08F12/32 , C08F297/02 , C08F297/026 , C08F297/046 , C09D153/02 , G03F7/0002 , Y10T428/268
Abstract: Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
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3.发明授权Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography 有权具有高Flory-Huggins嵌段共聚物光刻相互作用参数的嵌段共聚物公开(公告)号：US09587136B2
公开(公告)日：2017-03-07
申请号：US14048766
申请日：2013-10-08
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
IPC: C09D153/00 , C08F12/32 , C08F12/22 , C08F297/02 , G03F7/00
CPC classification number: C09D153/00 , C08F12/22 , C08F12/32 , C08F297/02 , C08F297/026 , C08F297/046 , C09D153/02 , G03F7/0002 , Y10T428/268
Abstract: Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
Abstract translation: 提供用于嵌段共聚物光刻的嵌段共聚物，嵌段共聚物的自组装膜和聚合嵌段共聚物的方法。 嵌段共聚物的特征在于高Flory-Huggins相互作用参数（χ）。 嵌段共聚物可以由保护的羟基苯乙烯单体或叔丁基苯乙烯和2-乙烯基吡啶单体聚合。
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4.发明申请BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY 有权具有高辉度-HGGINS嵌段共聚物交换参数的嵌段共聚物公开(公告)号：US20150099109A1
公开(公告)日：2015-04-09
申请号：US14048766
申请日：2013-10-08
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Daniel Patrick Sweat , Xiang Yu , Myungwoong Kim
IPC: C09D153/00 , C09D153/02
CPC classification number: C09D153/00 , C08F12/22 , C08F12/32 , C08F297/02 , C08F297/026 , C08F297/046 , C09D153/02 , G03F7/0002 , Y10T428/268
Abstract: Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
Abstract translation: 提供用于嵌段共聚物光刻的嵌段共聚物，嵌段共聚物的自组装膜和聚合嵌段共聚物的方法。 嵌段共聚物的特征在于高Flory-Huggins相互作用参数（χ）。 嵌段共聚物可以由保护的羟基苯乙烯单体或叔丁基苯乙烯和2-乙烯基吡啶单体聚合。
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