Invention Grant
- Patent Title: Electrostatic chuck device
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Application No.: US16070478Application Date: 2017-01-18
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Publication No.: US10923381B2Publication Date: 2021-02-16
- Inventor: Mamoru Kosakai , Yukio Miura , Kazunori Ishimura , Keisuke Maeda , Hitoshi Kouno , Yuuki Kinpara , Shinichi Maeta , Tomomi Ito
- Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Merchant & Gould P.C.
- Priority: JPJP2016-007861 20160119,JPJP2016-007862 20160119
- International Application: PCT/JP2017/001507 WO 20170118
- International Announcement: WO2017/126534 WO 20170727
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; H01L21/67 ; H02N13/00

Abstract:
An electrostatic chuck device includes: an electrostatic chuck part which incorporates an internal electrode for electrostatic attraction and has a placing surface on which a plate-like sample is placed; a base part which cools the electrostatic chuck part; and an adhesion layer which bonds the electrostatic chuck part and the base part to integrate the parts together, in which a first through-hole is provided in the electrostatic chuck part, a second through-hole that communicates with the first through-hole is provided in the base part, a tubular insulator is fixed in the second through-hole, an annular sealing member is sandwiched between the electrostatic chuck part and a distal end surface of the insulator, wherein the distal end surface is located on the electrostatic chuck part side of the insulator, and a tubular insulating wall member is located at the inner side of the sealing member in the radial direction.
Public/Granted literature
- US20190019714A1 ELECTROSTATIC CHUCK DEVICE Public/Granted day:2019-01-17
Information query
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