公开(公告)号：US10192766B2

公开(公告)日：2019-01-29

申请号：US15519098

申请日：2015-10-15

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Tomomi Ito ,  Yukio Miura

IPC: H01L21/683 ,  H02N13/00

Abstract: An electrostatic chuck device 80 includes: an electrostatic chuck section 2 having one principal surface serving as a placing surface on which a plate-shaped sample is placed, and having a built-in electrostatic attracting internal electrode; a first adhesion layer 4; a sheet material 6; a second adhesion layer 8; and a temperature adjusting base section 10 which adjusts a temperature of the electrostatic chuck section 2 to a desired temperature, in this order, in which the first adhesion layer 4 includes a joining layer 14 having a layer thickness in a range of 1 nm to 500 nm, and a silicone adhesive layer 24 having a thickness in a range of 2 μm to 30 μm, and the second adhesion layer 8 includes a joining layer 18 having a layer thickness in a range of 1 nm to 500 nm, and a silicone adhesive layer 28 having a thickness in a range of 2 μm to 30 μm.

公开(公告)号：US10957573B2

公开(公告)日：2021-03-23

申请号：US16073506

申请日：2017-01-19

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Tomomi Ito ,  Yukio Miura

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67

Abstract: An electrostatic chuck device includes: in order, an electrostatic chuck part having one principal surface serving as a placing surface on which a plate-shaped sample is placed, and having a built-in internal electrode for electrostatic attraction; a heating member bonded to a surface on the side opposite to the placing surface of the electrostatic chuck part in a pattern having gaps; a sheet material; and a base part having a function of cooling the electrostatic chuck part, in which a silicone resin sheet having a layer thickness of 10 μm or more and less than 200 μm and a Shore hardness (A) in a range of 10 to 70 is provided between the electrostatic chuck part and the heating member.

公开(公告)号：US10923381B2

公开(公告)日：2021-02-16

申请号：US16070478

申请日：2017-01-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Mamoru Kosakai ,  Yukio Miura ,  Kazunori Ishimura ,  Keisuke Maeda ,  Hitoshi Kouno ,  Yuuki Kinpara ,  Shinichi Maeta ,  Tomomi Ito

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H02N13/00

Abstract: An electrostatic chuck device includes: an electrostatic chuck part which incorporates an internal electrode for electrostatic attraction and has a placing surface on which a plate-like sample is placed; a base part which cools the electrostatic chuck part; and an adhesion layer which bonds the electrostatic chuck part and the base part to integrate the parts together, in which a first through-hole is provided in the electrostatic chuck part, a second through-hole that communicates with the first through-hole is provided in the base part, a tubular insulator is fixed in the second through-hole, an annular sealing member is sandwiched between the electrostatic chuck part and a distal end surface of the insulator, wherein the distal end surface is located on the electrostatic chuck part side of the insulator, and a tubular insulating wall member is located at the inner side of the sealing member in the radial direction.

公开(公告)号：US10593585B2

公开(公告)日：2020-03-17

申请号：US15460647

申请日：2017-03-16

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Tomomi Ito ,  Yukio Miura

IPC: H02N13/00 ,  H01L21/683

Abstract: An electrostatic chuck device includes: an electrostatic chuck section having one principal surface serving as a placing surface on which a plate-shaped sample is placed, and having a built-in electrostatic attracting internal electrode; a heating member bonded to a surface on the side opposite to the placing surface of the electrostatic chuck section in a pattern having gaps; a sheet material; and a base section having a function of cooling the electrostatic chuck section, in this order, in which each of the gaps of the pattern is filled with an inorganic filler composition which includes an inorganic filler and an adhesive.