Invention Grant
- Patent Title: Attachment feature removal from photomask in extreme ultraviolet lithography application
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Application No.: US16661541Application Date: 2019-10-23
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Publication No.: US10928724B2Publication Date: 2021-02-23
- Inventor: Banqiu Wu , Eli Dagan , Khalid Makhamreh , Bruce J. Fender
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F7/20 ; G03F1/62 ; G03F1/64

Abstract:
Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a photomask includes an attachment feature puller comprising an actuator, a clamp coupled to the actuator, the clamp adapted to grip an attachment feature, and a coil assembly disposed adjacent to the attachment feature.
Public/Granted literature
- US20200183268A1 ATTACHMENT FEATURE REMOVAL FROM PHOTOMASK IN EXTREME ULTRAVIOLET LITHOGRAPHY APPLICATION Public/Granted day:2020-06-11
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