- 专利标题: Nozzle for cleaning substrate
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申请号: US16198390申请日: 2018-11-21
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公开(公告)号: US10943799B2公开(公告)日: 2021-03-09
- 发明人: Man Ho Han , Young Min Ju , Guk Ki Ahn , Yun Deok Kim
- 申请人: HS HI-TECH CO., LTD.
- 申请人地址: KR Hwaseong
- 专利权人: HS HI-TECH CO., LTD.
- 当前专利权人: HS HI-TECH CO., LTD.
- 当前专利权人地址: KR Hwaseong
- 优先权: KR10-2017-0163667 20171130
- 主分类号: B08B3/02
- IPC分类号: B08B3/02 ; H01L21/67 ; B29C65/08 ; B29C65/00 ; B05B1/18 ; B29L31/00
摘要:
The present invention relates to a nozzle for cleaning a substrate capable of spraying deionized water for cleaning a substrate to the substrate, the nozzle including a first body made of a resin material and provided with a first part of a deionized water passage and a deionized water supply hole to supply the deionized water, a second body made of a resin material and provided with a second part of the deionized water passage and a plurality of spray holes to spray the deionized water to the substrate, a fusible protrusion provided in the first body or the second body along the deionized water passage and configured such that a part thereof is fused during ultrasonic welding, so as to couple the first body and the second body together, and a fusible protrusion accommodating part formed in the first body or the second body to accommodate the fusible protrusion.
公开/授权文献
- US20190164788A1 NOZZLE FOR CLEANING SUBSTRATE 公开/授权日:2019-05-30
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