利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

4 条记录 (耗时 0.014 秒)

    Nozzle for cleaning substrate
    3.
    发明授权
    Nozzle for cleaning substrate 有权

    公开(公告)号：US10943799B2

    公开(公告)日：2021-03-09

    申请号：US16198390

    申请日：2018-11-21

    申请人： HS HI-TECH CO., LTD.

    发明人： Man Ho Han ,  Young Min Ju ,  Guk Ki Ahn ,  Yun Deok Kim

    IPC分类号： B08B3/02 ,  H01L21/67 ,  B29C65/08 ,  B29C65/00 ,  B05B1/18 ,  B29L31/00

    摘要： The present invention relates to a nozzle for cleaning a substrate capable of spraying deionized water for cleaning a substrate to the substrate, the nozzle including a first body made of a resin material and provided with a first part of a deionized water passage and a deionized water supply hole to supply the deionized water, a second body made of a resin material and provided with a second part of the deionized water passage and a plurality of spray holes to spray the deionized water to the substrate, a fusible protrusion provided in the first body or the second body along the deionized water passage and configured such that a part thereof is fused during ultrasonic welding, so as to couple the first body and the second body together, and a fusible protrusion accommodating part formed in the first body or the second body to accommodate the fusible protrusion.