Invention Grant
- Patent Title: Device having overlapping semiconductor fins oriented in different directions
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Application No.: US16399808Application Date: 2019-04-30
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Publication No.: US10943837B2Publication Date: 2021-03-09
- Inventor: Qing Liu , John H. Zhang
- Applicant: STMicroelectronics, Inc.
- Applicant Address: US TX Coppell
- Assignee: STMicroelectronics, Inc.
- Current Assignee: STMicroelectronics, Inc.
- Current Assignee Address: US TX Coppell
- Agency: Seed IP Law Group LLP
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/06 ; H01L29/10 ; H01L27/02 ; H01L27/06 ; H01L27/088 ; H01L29/161 ; H01L29/423 ; H01L21/84 ; H01L21/266 ; H01L21/265 ; H01L21/308 ; H01L29/66

Abstract:
An analog integrated circuit is disclosed in which short channel transistors are stacked on top of long channel transistors, vertically separated by an insulating layer. With such a design, it is possible to produce a high density, high power, and high performance analog integrated circuit chip including both short and long channel devices that are spaced far enough apart from one another to avoid crosstalk. In one embodiment, the transistors are FinFETs and the long channel devices are multi-gate FinFETs. In one embodiment, single and dual damascene devices are combined in a multi-layer integrated circuit cell. The cell may contain various combinations and configurations of the short and long-channel devices. A high density cell can be made by simply shrinking the dimensions of the cells and replicating two or more cells in the same size footprint as the original cell.
Public/Granted literature
- US20190259673A1 STACKED SHORT AND LONG CHANNEL FINFETS Public/Granted day:2019-08-22
Information query
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