Invention Grant
- Patent Title: Integrated memory having the body region comprising a different semiconductor composition than the source/drain region
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Application No.: US16552257Application Date: 2019-08-27
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Publication No.: US10943915B1Publication Date: 2021-03-09
- Inventor: Kamal M. Karda , Albert Fayrushin , Haitao Liu , Kirk D. Prall
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L27/11553
- IPC: H01L27/11553 ; H01L27/11556 ; H01L27/11582

Abstract:
Some embodiments include an assembly having a memory cell with an active region which includes a body region between a pair of source/drain regions. A charge-storage material is adjacent to the body region. A conductive gate is adjacent to the charge-storage material. A hole-recharge arrangement is configured to replenish holes within the body region during injection of holes from the body region to the charge-storage material. The hole-recharge arrangement includes a heterostructure active region having at least one source/drain region of a different composition than the body region, and/or includes an extension coupling the body region with a hole-reservoir. A wordline is coupled with the conductive gate. A first comparative digit line is coupled with one of the source/drain regions, and a second comparative digit line is coupled with the other of the source/drain regions.
Public/Granted literature
Information query
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