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公开(公告)号:US12200928B2
公开(公告)日:2025-01-14
申请号:US17387669
申请日:2021-07-28
Applicant: Micron Technology, Inc.
Inventor: Haitao Liu , Kamal M. Karda , Albert Fayrushin , Yingda Dong
IPC: H10B43/27 , H01L21/28 , H01L29/423 , H10B41/27
Abstract: Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a memory cell included in a memory cell string; the memory cell including charge storage structure and channel structure separated from the charge storage structure by a dielectric structure; a first control gate associated with the memory cell and located on a first side of the charge storage structure and a first side of the channel structure; and a second control gate associated with the memory cell and electrically separated from the first control gate, the second control gate located on a second side of the charge storage structure and a second side of the channel structure.
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公开(公告)号:US11778824B2
公开(公告)日:2023-10-03
申请号:US17140494
申请日:2021-01-04
Applicant: Micron Technology, Inc.
Inventor: Albert Fayrushin , Haitao Liu , Mojtaba Asadirad
IPC: H10B43/27 , H01L29/10 , H01L23/522 , H01L23/528 , H01L21/02 , H01L21/768 , H01L23/532 , G11C16/04 , G11C16/10 , G11C16/26 , G11C16/14
CPC classification number: H10B43/27 , H01L21/02532 , H01L21/02595 , H01L21/76877 , H01L23/528 , H01L23/5226 , H01L23/53271 , H01L29/1037 , G11C16/0483 , G11C16/10 , G11C16/14 , G11C16/26 , H01L21/0262 , H01L21/02546
Abstract: A semiconductor device comprises a stack comprising an alternating sequence of dielectric structures and conductive structures, and a channel structure within an opening vertically extending through the stack and comprising a first semiconductor material having a first band gap. The semiconductor device also comprises a conductive plug structure within the opening and in direct contact with the channel region, and a band offset structure within the opening and in direct physical contact with the channel structure and the conductive plug structure. The band offset structure comprises a second semiconductor material having a second band gap different than the first band gap. The semiconductor device further comprises a conductive line structure electrically coupled to the conductive plug structure. A method of forming a semiconductor device and an electronic system are also described.
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公开(公告)号:US20220392533A1
公开(公告)日:2022-12-08
申请号:US17888041
申请日:2022-08-15
Applicant: Micron Technology, Inc.
Inventor: Albert Fayrushin , Augusto Benvenuti , Akira Goda , Luca Laurin , Haitao Liu
Abstract: Some embodiments include apparatuses and methods of operating the apparatuses. One of the apparatuses includes a memory cell string having first, second, third, fourth, and fifth memory cells; access lines including first, second, third, fourth, and fifth access lines coupled to the first, second, third, fourth, and fifth memory cells, respectively, and a module. The first memory cell is between the second and third memory cells. The second memory cell is between the first and fourth memory cells. The third memory cell is between the first and fifth memory cells. The module is to couple the first access line to a ground node at a first time of a memory operation, couple the second and third access lines to the ground node at a second time of the operation after the first time, and couple the fourth and fifth access lines to the ground node at a third time of the operation after the second time.
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公开(公告)号:US20200083245A1
公开(公告)日:2020-03-12
申请号:US16123538
申请日:2018-09-06
Applicant: Micron Technology, Inc.
Inventor: Albert Fayrushin , Haitao Liu , Mojtaba Asadirad
IPC: H01L27/11582 , H01L29/10 , H01L23/522 , H01L23/528 , H01L21/02 , H01L21/768 , H01L23/532
Abstract: A semiconductor device comprises a stack comprising an alternating sequence of dielectric structures and conductive structures, and a channel structure within an opening vertically extending through the stack and comprising a first semiconductor material having a first band gap. The semiconductor device also comprises a conductive plug structure within the opening and in direct contact with the channel region, and a band offset structure within the opening and in direct physical contact with the channel structure and the conductive plug structure. The band offset structure comprises a second semiconductor material having a second band gap different than the first band gap. The semiconductor device further comprises a conductive line structure electrically coupled to the conductive plug structure. A method of forming a semiconductor device and an electronic system are also described.
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公开(公告)号:US20240389329A1
公开(公告)日:2024-11-21
申请号:US18666358
申请日:2024-05-16
Applicant: Micron Technology, Inc.
Inventor: Albert Fayrushin , Haitao Liu , Kamal M. Karda
Abstract: Some embodiments include apparatuses and methods of operating the apparatuses. One of the apparatuses includes a memory device, which includes a first memory cell string, a second memory cell string adjacent the first memory cell string, and a control gate. The first memory string includes a first channel structure, a first charge storage structure, and a first dielectric structure between the first channel structure and the first charge storage structure. The second memory cell string includes a second channel structure, a second charge storage structure, and a second dielectric structure between the second channel structure and the second charge storage structure. The control gate is separated from the first charge storage structure by a third dielectric structure and separated from the second channel structure by a fourth dielectric structure. The control gate and the first charge storage structure are between the first channel structure and the second channel structure.
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公开(公告)号:US20240074201A1
公开(公告)日:2024-02-29
申请号:US17893436
申请日:2022-08-23
Applicant: Micron Technology, Inc.
Inventor: Matthew J. King , Albert Fayrushin , Sidhartha Gupta , Jun Fujiki , Masashi Yoshida , Yiping Wang , Taehyun Kim , Arun Kumar Dhayalan
IPC: H01L27/1157 , H01L27/11524 , H01L27/11556 , H01L27/11582
CPC classification number: H01L27/1157 , H01L27/11524 , H01L27/11556 , H01L27/11582
Abstract: A method used in forming a memory array comprising strings of memory cells comprises forming a stack comprising vertically-alternating different-composition first tiers and second tiers. The stack comprises lower channel-material strings extending through the first tiers and the second tiers. Conductive masses are formed that comprise at least one of conductively-doped semiconductive material or conductive metal material. Individual of the conductive masses are atop and directly electrically coupled to individual of the lower channel-material strings. Upper channel-material strings of select-gate transistors are formed directly above the stack. Individual of the upper channel-material strings are directly above and directly electrically coupled to individual of the conductive masses. Other embodiments, including structure, are disclosed.
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公开(公告)号:US20240071500A1
公开(公告)日:2024-02-29
申请号:US18234046
申请日:2023-08-15
Applicant: MICRON TECHNOLOGY, INC.
Inventor: Jae Kyu Choi , Jin Yue , Kyubong Jung , Albert Fayrushin , Jae Young Ahn , Jun Kyu Yang
CPC classification number: G11C16/0483 , H10B41/10 , H10B41/27 , H10B41/35 , H10B43/10 , H10B43/27 , H10B43/35
Abstract: Memory array structures, and methods of their formation, might include a first memory cell having a first control gate and an adjacent first portion of a charge-blocking structure, a second memory cell having a second control gate and an adjacent second portion of the charge-blocking structure, and a first dielectric material between the first control gate and the second control gate, and adjacent to a third portion of the charge-blocking structure that is between the first and second portions of the charge-blocking structure. The third portion of the charge-blocking structure might include a second dielectric material and a third dielectric material different than the second dielectric material, and the first portion of the charge-blocking structure and the second portion of the charge-blocking structure might each include the third dielectric material and a fourth dielectric material different than the second dielectric material. Apparatus might include such memory array structures.
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公开(公告)号:US11417396B2
公开(公告)日:2022-08-16
申请号:US17067550
申请日:2020-10-09
Applicant: Micron Technology, Inc.
Inventor: Albert Fayrushin , Augusto Benvenuti , Akira Goda , Luca Laurin , Haitao Liu
Abstract: Some embodiments include apparatuses and methods of operating the apparatuses. One of the apparatuses includes a memory cell string having first, second, third, fourth, and fifth memory cells; access lines including first, second, third, fourth, and fifth access lines coupled to the first, second, third, fourth, and fifth memory cells, respectively, and a module. The first memory cell is between the second and third memory cells. The second memory cell is between the first and fourth memory cells. The third memory cell is between the first and fifth memory cells. The module is to couple the first access line to a ground node at a first time of a memory operation, couple the second and third access lines to the ground node at a second time of the operation after the first time, and couple the fourth and fifth access lines to the ground node at a third time of the operation after the second time.
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公开(公告)号:US20220149068A1
公开(公告)日:2022-05-12
申请号:US17092916
申请日:2020-11-09
Applicant: Micron Technology, Inc.
Inventor: Yifen Liu , Yan Song , Albert Fayrushin , Naiming Liu , Yingda Dong , George Matamis
IPC: H01L27/11582 , H01L27/11565 , H01L27/1157 , H01L27/11573 , H01L23/522
Abstract: An electronic device comprises a stack of alternating dielectric materials and conductive materials, a pillar region extending vertically through the stack, an oxide material within the pillar region and laterally adjacent to the dielectric materials and the conductive materials of the stack, and a storage node laterally adjacent to the oxide material and within the pillar region. A charge confinement region of the storage node is in horizontal alignment with the conductive materials of the stack. A height of the charge confinement region in a vertical direction is less than a height of a respective, laterally adjacent conductive material of the stack in the vertical direction. Related methods and systems are also disclosed.
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公开(公告)号:US11322516B2
公开(公告)日:2022-05-03
申请号:US17007951
申请日:2020-08-31
Applicant: Micron Technology, Inc.
Inventor: Matthew J. King , David A. Daycock , Yoshiaki Fukuzumi , Albert Fayrushin , Richard J. Hill , Chandra S. Tiwari , Jun Fujiki
IPC: H01L27/11582 , H01L21/762 , H01L29/06
Abstract: Microelectronic devices include a stack structure comprising a vertically alternating sequence of insulative structures and conductive structures arranged in tiers. A series of pillars extends through the stack structure. At least one isolation structure extends through an upper stack portion of the stack structure. The at least one isolation structure protrudes into pillars of neighboring columns of pillars of the series of pillars. Conductive contacts are in electrical communication with the pillars into which the at least one isolation structure protrudes. Related methods and electronic systems are also disclosed.
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