Invention Grant
- Patent Title: Selection of measurement locations for patterning processes
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Application No.: US16067303Application Date: 2016-12-15
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Publication No.: US10962886B2Publication Date: 2021-03-30
- Inventor: Hans Van Der Laan , Wim Tjibbo Tel , Marinus Jochemsen , Stefan Hunsche
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2016/081195 WO 20161215
- International Announcement: WO2017/114662 WO 20170706
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06F30/398 ; H01L21/66

Abstract:
Provided is a process of selecting a measurement location, the process including: obtaining pattern data describing a pattern to be applied to substrates in a patterning process; obtaining a process characteristic measured during or following processing of a substrate, the process characteristic characterizing the processing of the substrate; determining a simulated result of the patterning process based on the pattern data and the process characteristic; and selecting a measurement location for the substrate based on the simulated result.
Public/Granted literature
- US20190025705A1 SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES Public/Granted day:2019-01-24
Information query
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