Invention Grant
- Patent Title: Photoresist composition
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Application No.: US14491120Application Date: 2014-09-19
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Publication No.: US10969685B2Publication Date: 2021-04-06
- Inventor: Masako Sugihara , Maki Kawamura , Maiko Goda
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2013-196744 20130924
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/039
Abstract:
A photoresist composition comprising: a resin which has an acid-labile group; an acid generator; a compound which has a sulfide bond and a mercapto group; and a solvent.
Public/Granted literature
- US20150086927A1 PHOTORESIST COMPOSITION Public/Granted day:2015-03-26
Information query
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