Invention Grant
- Patent Title: Radio frequency (RF) power monitoring device and plasma enhanced (PE) system including the same
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Application No.: US16661579Application Date: 2019-10-23
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Publication No.: US10971335B2Publication Date: 2021-04-06
- Inventor: Hyungjoon Kim , Myoungwoon Kim , Hee jong Jeong
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, PC
- Priority: KR10-2019-0049827 20190429
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01P5/02
Abstract:
A radio frequency (RF) power monitoring device includes an RF sensor to monitor RF power transferred to a target load and an impedance of the target load and a transmission line to electrically connect the RF sensor to the target load and to transfer the RF power to the target load. A phase (φz) of the impedance of the target load is adjusted to satisfy a range of −30°+180°*n
Public/Granted literature
- US20200343075A1 RADIO FREQUENCY (RF) POWER MONITORING DEVICE AND PLASMA ENHANCED (PE) SYSTEM INCLUDING THE SAME Public/Granted day:2020-10-29
Information query
