- 专利标题: Semiconductor structure having both gate-all-around devices and planar devices
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申请号: US16393166申请日: 2019-04-24
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公开(公告)号: US10971630B2公开(公告)日: 2021-04-06
- 发明人: Jhon Jhy Liaw
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L21/44
- IPC分类号: H01L21/44 ; H01L29/786 ; H01L29/423 ; H01L21/8238 ; H01L27/092 ; H01L29/775
摘要:
An integrated circuit includes gate-all-around (GAA) nanowire transistors, GAA nanosheet transistors, and planar devices on the same substrate. Gate dielectric layers of the GAA nanowire transistors and the GAA nanosheet transistors have substantially the same thickness which is smaller than the thickness of the gate dielectric layer of the planar devices. The channel width of the planar devices is greater than the channel width of the GAA nanosheet transistors, which is greater than the channel width of the GAA nanowire transistors.
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