Invention Grant
- Patent Title: Method of manufacturing a waveguide
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Application No.: US16662810Application Date: 2019-10-24
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Publication No.: US10976494B2Publication Date: 2021-04-13
- Inventor: Cédric Durand , Frédéric Gianesello , Folly Eli Ayi-Yovo
- Applicant: STMicroelectronics SA
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics SA
- Current Assignee: STMicroelectronics SA
- Current Assignee Address: FR Montrouge
- Agency: Slater Matsil, LLP
- Priority: FR1659923 20161013,FR1659924 20161013
- Main IPC: B23K26/364
- IPC: B23K26/364 ; C03C17/09 ; G02B6/136 ; G02B6/138 ; G02B6/30 ; C03C23/00 ; B23K26/402 ; B23K26/0622 ; B23K103/00 ; G02B6/12

Abstract:
A method of manufacturing an optical device is disclosed. The method includes scanning along a curved path at a first surface of a glass plate with a laser beam directed orthogonally to the first surface to form a trench according to a pattern of a waveguide. The curved path is coincident with a longitudinal axis of the waveguide. The method further includes filling the trench with a material having an index different from that of glass to form the waveguide and, after filling the trench, depositing a cladding layer.
Public/Granted literature
- US20200057200A1 Method of Manufacturing a Waveguide Public/Granted day:2020-02-20
Information query
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