- 专利标题: Wafer producing apparatus
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申请号: US16000462申请日: 2018-06-05
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公开(公告)号: US10981250B2公开(公告)日: 2021-04-20
- 发明人: Kentaro Iizuka , Naoki Omiya , Takashi Mori , Satoshi Yamanaka , Kazuya Hirata
- 申请人: DISCO CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer, Burns & Crain, Ltd.
- 优先权: JPJP2017-113391 20170608
- 主分类号: B23K26/53
- IPC分类号: B23K26/53 ; H01L21/02 ; B23K26/00 ; H01L29/16 ; B23K103/00
摘要:
A SiC wafer is produced from a single crystal SiC ingot. Wafer producing apparatus includes a holding unit for holding the ingot, a flattening unit for grinding the upper surface of the ingot, thereby flattening the upper surface, a laser applying unit for setting the focal point of a laser beam having a transmission wavelength to the ingot inside the ingot at a predetermined depth from the upper surface of the ingot, the predetermined depth corresponding to the thickness of the wafer to be produced, and next applying the laser beam to the ingot to thereby form a separation layer for separating the wafer from the ingot, a wafer separating unit for holding the upper surface of the ingot to separate the wafer from the ingot along the separation layer, and a wafer storing unit for storing the wafer separated from the ingot.
公开/授权文献
- US20180354067A1 WAFER PRODUCING APPARATUS 公开/授权日:2018-12-13
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