Invention Grant
- Patent Title: Photosensitive compositions, preparation methods thereof, quantum dot polymer composite prepared therefrom
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Application No.: US15241208Application Date: 2016-08-19
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Publication No.: US10983432B2Publication Date: 2021-04-20
- Inventor: Shin Ae Jun , Shang Hyeun Park , Hojeong Paek , Jonggi Kim , Hyeyeon Yang , Eun Joo Jang , Yong Seok Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , Samsung SDI Co., Ltd.
- Applicant Address: KR Suwon-si, Gyeonggi-do; KR Yongin-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,Samsung SDI Co., Ltd.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,Samsung SDI Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do; KR Yongin-si, Gyeonggi-do
- Agency: Cantor Colburn LLP
- Priority: KR10-2015-0119128 20150824
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/033 ; G02B5/22 ; G02B5/20 ; C09K11/08 ; C09K11/02 ; G03F7/004
Abstract:
A photosensitive composition including a quantum dot dispersion, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes an acid group-containing polymer and a plurality of quantum dots dispersed in the acid group-containing polymer, and wherein the acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group or a phosphonic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic group and not having a carboxylic acid group and a phosphonic acid group.
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