Invention Grant
- Patent Title: Methods and apparatus for three dimensional NAND structure fabrication
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Application No.: US16517956Application Date: 2019-07-22
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Publication No.: US10998329B2Publication Date: 2021-05-04
- Inventor: Takehito Koshizawa , Mukund Srinivasan , Tomohiko Kitajima , Chang Seok Kang , Sung-Kwan Kang , Gill Y. Lee , Susmit Singha Roy
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: H01L27/1157
- IPC: H01L27/1157 ; H01L27/11582

Abstract:
Methods and apparatus for forming a plurality of nonvolatile memory cells are provided herein. In some embodiments, the method, for example, includes forming a plurality of nonvolatile memory cells, comprising forming, on a substrate, a stack of alternating layers of metal including a first layer of metal and a second layer of metal different from the first layer of metal; removing the first layer of metal to form spaces between the alternating layers of the second layer of metal; and one of depositing a first layer of material to partially fill the spaces to leave air gaps therein or depositing a second layer of material to fill the spaces.
Public/Granted literature
- US20200373310A1 METHODS AND APPARATUS FOR THREE DIMENSIONAL NAND STRUCTURE FABRICATION Public/Granted day:2020-11-26
Information query
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