Invention Grant
- Patent Title: Method of growing two-dimensional transition metal dichalcogenide thin film and method of manufacturing device including the same
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Application No.: US16922330Application Date: 2020-07-07
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Publication No.: US11018001B2Publication Date: 2021-05-25
- Inventor: Haeryong Kim , Hyeonjin Shin , Jaeho Lee , Sanghyun Jo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0161855 20171129
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/66 ; H01L29/786 ; H01L29/778 ; H01L29/24

Abstract:
A method of growing a two-dimensional transition metal dichalcogenide (TMD) thin film and a method of manufacturing a device including the two-dimensional TMD thin film are provided. The method of growing the two-dimensional TMD thin film may include a precursor supply operation and an evacuation operation, which are periodically and repeatedly performed in a reaction chamber provided with a substrate for thin film growth. The precursor supply operation may include supplying two or more kinds of precursors of a TMD material to the reaction chamber. The evacuation operation may include evacuating the two or more kinds of precursors and by-products generated therefrom from the reaction chamber.
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Information query
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