Invention Grant
- Patent Title: Process monitoring
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Application No.: US16405920Application Date: 2019-05-07
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Publication No.: US11022565B2Publication Date: 2021-06-01
- Inventor: Dror Shemesh , Eugene T. Bullock , Adi Boehm , Gurjeet Singh
- Applicant: APPLIED MATERIALS ISRAEL LTD.
- Applicant Address: IL Rehovot
- Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; G01N21/88

Abstract:
A method for determining a defect material element, the method includes (a) acquiring, by a charged particle beam system and by applying a spectroscopy process, an electromagnetic emission spectrum of a part of a defect; (b) acquiring, by the charged particle beam system, a backscattered electron (BSE) image of an area that includes the defect; and (c) determining a defect material element. The determining of the defect material element includes: determining whether an ambiguity exists in the electromagnetic emission spectrum, and resolving the ambiguity based on the BSE image, when it is determined that the ambiguity exists.
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