Invention Grant
- Patent Title: Removal of moisture from hydrazine
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Application No.: US15806938Application Date: 2017-11-08
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Publication No.: US11027974B2Publication Date: 2021-06-08
- Inventor: Hideharu Shimizu , Mark Raynor , Daniel Tempel , Robin Gardiner , Daniel Alvarez, Jr.
- Applicant: Matheson Tri-Gas, Inc.
- Applicant Address: US NJ Basking Ridge
- Assignee: Matheson Tri-Gas, Inc.
- Current Assignee: Matheson Tri-Gas, Inc.
- Current Assignee Address: US NJ Basking Ridge
- Main IPC: B01D53/26
- IPC: B01D53/26 ; C01B21/16 ; B01D53/28 ; B01J20/04 ; B01J20/08 ; B01J20/10 ; B01J20/26 ; B01J20/28 ; B01J20/282 ; B01J20/283 ; B01J20/284 ; B01J20/285
Abstract:
The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).
Public/Granted literature
- US20180127272A1 REMOVAL OF MOISTURE FROM HYDRAZINE Public/Granted day:2018-05-10
Information query
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