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公开(公告)号：US20180127272A1
公开(公告)日：2018-05-10
申请号：US15806938
申请日：2017-11-08
IPC分类号： C01B21/16 , B01J20/04 , B01J20/26 , B01J20/10 , B01J20/08 , B01J20/28 , B01J20/282 , B01J20/283 , B01J20/284 , B01J20/285 , B01D53/26 , B01D53/28
CPC分类号： C01B21/16 , B01D53/261 , B01D53/263 , B01D53/28 , B01D2251/30 , B01D2251/302 , B01D2251/304 , B01D2251/306 , B01D2251/402 , B01D2251/404 , B01D2251/406 , B01D2251/408 , B01D2252/30 , B01D2253/104 , B01D2253/106 , B01D2253/1085 , B01D2253/112 , B01D2253/1122 , B01D2253/1124 , B01D2253/306 , B01D2253/311 , B01D2256/00 , B01J20/04 , B01J20/041 , B01J20/08 , B01J20/103 , B01J20/26 , B01J20/28061 , B01J20/28064 , B01J20/28071 , B01J20/28073 , B01J20/28076 , B01J20/282 , B01J20/283 , B01J20/284 , B01J20/285 , B01J2220/52 , C01P2006/82
摘要： The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).
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公开(公告)号：US20220299170A1
公开(公告)日：2022-09-22
申请号：US17654952
申请日：2022-03-15
发明人： Mark Raynor , Rikard Wind
IPC分类号： F17C13/04 , F16K24/04 , F17C11/00 , B01J20/28 , B01J20/08 , B01J20/02 , B01J20/04 , B01J20/22 , B01J20/10 , B01J20/20 , B01J20/18
摘要： The present invention relates to cylinder packages utilized in the delivery of highly toxic and/or flammable compounds to semiconductor manufacturers. More specifically, the present invention provides a cartridge adapted to removably attach to the gas outlet of a gas discharge passageway in a cylinder valve provided on a toxic gas containing cylinder package, the cartridge comprising a cylindrically shaped housing having at least one end fitted with a barrier member permeable to the toxic gas contained within the cylinder package and the housing containing a toxic-gas getter material.
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公开(公告)号：US11027974B2
公开(公告)日：2021-06-08
申请号：US15806938
申请日：2017-11-08
IPC分类号： B01D53/26 , C01B21/16 , B01D53/28 , B01J20/04 , B01J20/08 , B01J20/10 , B01J20/26 , B01J20/28 , B01J20/282 , B01J20/283 , B01J20/284 , B01J20/285
摘要： The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).
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