- 专利标题: Substrate treating apparatus
-
申请号: US16554816申请日: 2019-08-29
-
公开(公告)号: US11049749B2公开(公告)日: 2021-06-29
- 发明人: Masafumi Maeda , Masaki Nishida
- 申请人: SCREEN Holdings Co., Ltd.
- 申请人地址: JP Kyoto
- 专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: Ostrolenk Faber LLP
- 优先权: JPJP2018-178010 20180921
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; H01L21/67
摘要:
A substrate treating apparatus includes an indexer, a first processing section, a first transport mechanism, a second processing section, a second transport mechanism, a first mount table, a second mount table, and a controller. The first transport mechanism repeatedly performs a first cycle operation composed of three access operations (specifically, a first access operation, a second access operation, and a third access operation). The second transport mechanism repeatedly performs a second cycle operation composed of three access operations (specifically, a fourth access operation, a fifth access operation, and a sixth access operation).
公开/授权文献
- US20200098610A1 SUBSTRATE TREATING APPARATUS 公开/授权日:2020-03-26
信息查询
IPC分类: