发明授权
- 专利标题： Method of production of uniform metal plates and sputtering targets made thereby
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申请号： US15993075申请日： 2018-05-30
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公开(公告)号： US11062889B2公开(公告)日： 2021-07-13
- 发明人: Eugene Y. Ivanov , Eduardo del Rio
- 申请人： Tosoh SMD, Inc.
- 申请人地址： US OH Grove City
- 专利权人： Tosoh SMD, Inc.
- 当前专利权人： Tosoh SMD, Inc.
- 当前专利权人地址： US OH Grove City
- 代理机构： Wegman Hessler
- 主分类号： H01J37/34
- IPC分类号： H01J37/34 ; C23C14/34 ; B22F5/00 ; B22F3/18 ; B22F3/16
摘要：
A method of making a metal or metal alloy target having the steps of providing a billet, the billet having a generally cylindrical configuration and having a central axis, cutting the billet in half parallel to the central axis to form at least a half cylindrical blank, and cross rolling the half cylindrical blank to form a target.
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