Invention Grant
- Patent Title: Direct bonded copper ceramic substrate
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Application No.: US16721509Application Date: 2019-12-19
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Publication No.: US11076483B2Publication Date: 2021-07-27
- Inventor: Kai-Hsiang Chuang , Chien-Chiang Hsu , Chien-Chung Hsu , Kuo-Chuang Chiu
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Priority: TW108142898 20191126
- Main IPC: B32B15/04
- IPC: B32B15/04 ; H05K1/03 ; C04B37/02

Abstract:
A direct bonded copper ceramic substrate is provided, which includes a nitride ceramic substrate, a first passivation layer, and a first copper layer. The first passivation layer includes aluminum oxide or silicon oxide doped with another metal. The other metal is titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, or a combination thereof. The aluminum or silicon and the other metal have a weight ratio of 60:40 to 99.5:0.5. The first passivation layer is disposed between the top surface of the nitride ceramic substrate and the first copper layer.
Public/Granted literature
- US20210161006A1 DIRECT BONDED COPPER CERAMIC SUBSTRATE Public/Granted day:2021-05-27
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