- 专利标题: Air channel formation in packaging process
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申请号: US16427516申请日: 2019-05-31
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公开(公告)号: US11088094B2公开(公告)日: 2021-08-10
- 发明人: Wan-Yu Lee , Chiang Lin , Yueh-Ting Lin , Hua-Wei Tseng , Li-Hsien Huang , Yu-Hsiang Hu
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L21/82
- IPC分类号: H01L21/82 ; H01L23/58 ; H01L23/48 ; H01L23/00 ; H01L23/31 ; H01L23/522 ; H01L23/528 ; H01L21/56
摘要:
A method includes forming a reconstructed wafer including encapsulating a device die in an encapsulant, forming a dielectric layer over the device die and the encapsulant, forming a plurality of redistribution lines extending into the dielectric layer to electrically couple to the device die, and forming a metal ring in a common process for forming the plurality of redistribution lines. The metal ring encircles the plurality of redistribution lines, and the metal ring extends into scribe lines of the reconstructed wafer. A die-saw process is performed along scribe lines of the reconstructed wafer to separate a package from the reconstructed wafer. The package includes the device die and at least a portion of the metal ring.
公开/授权文献
- US20200381373A1 Air Channel Formation in Packaging Process 公开/授权日:2020-12-03
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