PACKAGE STRUCTURE AND METHOD OF FORMING THE SAME

    公开(公告)号:US20240128143A1

    公开(公告)日:2024-04-18

    申请号:US18162715

    申请日:2023-02-01

    摘要: Provided are a package structure and a method of forming the same. The method includes: forming an interconnect structure on a substrate; performing a laser grooving process to form a first opening in the interconnect structure and form a debris layer on a sidewall of the first opening in a same step; forming a protective layer to fill in the first opening and cover the debris layer and the interconnect structure; patterning the protective layer to form a second opening, wherein the second opening is spaced from the debris layer by the protective layer; performing a planarization process on the protective layer to expose a topmost contact pad of the interconnect structure; and performing a mechanical dicing process through the second opening to form a third opening in the substrate and cut the substrate into a plurality of semiconductor dies.

    PACKAGE STRUCTURE INCLUDING IPD AND METHOD OF FORMING THE SAME

    公开(公告)号:US20220278067A1

    公开(公告)日:2022-09-01

    申请号:US17185970

    申请日:2021-02-26

    IPC分类号: H01L23/00 H01L49/02

    摘要: A package structure including IPD and method of forming the same are provided. The package structure includes a die, an encapsulant laterally encapsulating the die, a first RDL structure disposed on the encapsulant and the die, an IPD disposed on the first RDL structure and an underfill layer. The IPD includes a substrate, a first connector on a first side of the substrate and electrically connected to the first RDL structure, a guard structure on a second side of the substrate opposite to the first side and laterally surrounding a connector region, and a second connector disposed within the connector region and electrically connected to a conductive via embedded in the substrate. The underfill layer is disposed to at least fill a space between the first side of the IPD and the first RDL structure. The underfill layer is separated from the connector region by the guard structure.