Invention Grant
- Patent Title: Plasma reactor with electrode array in ceiling
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Application No.: US15630658Application Date: 2017-06-22
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Publication No.: US11114284B2Publication Date: 2021-09-07
- Inventor: Kenneth S. Collins , Michael R. Rice , Kartik Ramaswamy , James D. Carducci , Shahid Rauf , Kallol Bera
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; C23C16/458 ; C23C16/509

Abstract:
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an electrode assembly comprising a plurality of conductors spaced apart from and extending laterally across the workpiece support in a parallel coplanar array, a first RF power source to supply a first RF power to the electrode assembly, and a dielectric bottom plate between the electrode assembly and the workpiece support, the dielectric bottom plate providing an RF window between the electrode assembly and the plasma chamber.
Public/Granted literature
- US20180374685A1 PLASMA REACTOR WITH ELECTRODE ARRAY IN CEILING Public/Granted day:2018-12-27
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