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公开(公告)号:US20240401197A1
公开(公告)日:2024-12-05
申请号:US18802354
申请日:2024-08-13
Applicant: Applied Materials, Inc.
Inventor: Xiaowei WU , Jennifer Y. Sun , Michael R. Rice
IPC: C23C16/455 , C23C16/30
Abstract: Embodiments of the present disclosure relate to articles, coated articles and methods of coating such articles with a rare earth metal containing fluoride coating. The coating can contain at least a first metal (e.g., a rare earth metal, tantalum, zirconium, etc.) and a second metal that have been co-deposited onto a surface of the article. The coating can include a homogenous mixture of the first metal and the second metal and does not contain mechanical segregation between layers in the coating.
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公开(公告)号:US12159796B2
公开(公告)日:2024-12-03
申请号:US18107701
申请日:2023-02-09
Applicant: Applied Materials, Inc.
Inventor: Jacob Newman , Andrew J. Constant , Michael R. Rice , Paul B. Reuter , Shay Assaf , Sushant S. Koshti
IPC: H01L21/67 , B65G47/90 , H01L21/677
Abstract: Devices, systems, and methods for integrating load locks into a factory interface footprint space. A factory interface for an electronic device manufacturing system can include an interior volume defined by a bottom, a top and a plurality of sides, a load lock disposed within the interior volume of the factory interface, and a factory interface robot disposed within the interior volume of the factory interface, wherein the factory interface robot is configured to transfer substrates between a set of substrate carriers and the load lock.
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公开(公告)号:US11621182B2
公开(公告)日:2023-04-04
申请号:US17080595
申请日:2020-10-26
Applicant: Applied Materials, Inc.
Inventor: Devendra Channappa Holeyannavar , Sandesh Doddamane Ramappa , Dean C. Hruzek , Michael R. Rice , Jeffrey A. Brodine
IPC: H01L21/67 , H01L21/673 , H01L21/677
Abstract: An equipment front end module (EFEM) includes sidewalls forming an EFEM chamber configured to receive inert gas from an inert gas supply. The sidewalls include a first sidewall configured to attach to a panel first side of a panel. The panel forms a panel opening extending between the panel first side and a panel second side. The panel second side is configured to attach to a side storage pod. The EFEM further includes a robot disposed in the EFEM chamber. The robot is configured to transfer substrates from the EFEM chamber into the side storage pod via the panel opening. An exhaust conduit is coupled to the side storage pod to exhaust gas from the side storage pod to an exterior of the side storage pod.
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公开(公告)号:US20220084795A1
公开(公告)日:2022-03-17
申请号:US17519451
申请日:2021-11-04
Applicant: Applied Materials, Inc.
Inventor: Kenneth S. Collins , Michael R. Rice , James D. Carducci , Daisuke Shimizu
IPC: H01J37/32 , C23C16/505 , C23C16/455 , H01L21/67 , C23C16/52
Abstract: Embodiments disclosed herein include a plasma treatment chamber, comprising one or more sidewalls. A support surface within the one or more sidewalls holds a workpiece. A first gas injector along the one or more sidewalls injects a first gas flow in a first direction generally parallel to and across a surface of the workpiece. A first pump port along the one or more sidewalls generally opposite of the first gas injector pumps out the first gas flow. A second gas injector along the one or more sidewalls injects a second gas flow in a second direction generally parallel to and across the surface of the workpiece. A second pump port along the one or more sidewalls generally opposite of the second gas injector pumps out the second gas flow. The first and second gas flows comprise a process gas mixture and/or an independent gas injection (IGI) mixture.
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公开(公告)号:US20220068677A1
公开(公告)日:2022-03-03
申请号:US17392392
申请日:2021-08-03
Applicant: APPLIED MATERIALS, INC.
Inventor: Jacob Newman , Andrew J. Constant , Michael R. Rice , Paul B. Reuter , Shay Assaf , Sushant S. Koshti
IPC: H01L21/67 , H01L21/687 , H01L21/677 , B65G47/90
Abstract: The disclosure describes devices, systems, and methods for integrating load locks into a factory interface footprint space. A factory interface for an electronic device manufacturing system can include an interior volume defined by a bottom, a top and a plurality of sides, a first load lock disposed within the interior volume of the factory interface, and a first factory interface robot disposed within the interior volume of the factory interface, wherein the first factory interface robot is configured to transfer substrates between a first set of substrate carriers and the first load lock.
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公开(公告)号:US11114284B2
公开(公告)日:2021-09-07
申请号:US15630658
申请日:2017-06-22
Applicant: Applied Materials, Inc.
Inventor: Kenneth S. Collins , Michael R. Rice , Kartik Ramaswamy , James D. Carducci , Shahid Rauf , Kallol Bera
IPC: H01J37/32 , C23C16/455 , C23C16/458 , C23C16/509
Abstract: A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an electrode assembly comprising a plurality of conductors spaced apart from and extending laterally across the workpiece support in a parallel coplanar array, a first RF power source to supply a first RF power to the electrode assembly, and a dielectric bottom plate between the electrode assembly and the workpiece support, the dielectric bottom plate providing an RF window between the electrode assembly and the plasma chamber.
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公开(公告)号:US11043360B2
公开(公告)日:2021-06-22
申请号:US15414379
申请日:2017-01-24
Applicant: Applied Materials, Inc.
Inventor: James D. Carducci , Kenneth S. Collins , Kartik Ramaswamy , Michael R. Rice , Richard Charles Fovell , Vijay D. Parkhe
IPC: H01J37/32
Abstract: A gas distribution plate assembly for a processing chamber is provided that in one embodiment includes a body made of a metallic material, a base plate comprising a silicon infiltrated metal matrix composite coupled to the body, and a perforated faceplate comprising a silicon disk coupled to the base plate by a bond layer.
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公开(公告)号:US20210043479A1
公开(公告)日:2021-02-11
申请号:US17080595
申请日:2020-10-26
Applicant: Applied Materials, Inc.
Inventor: Devendra Channappa Holeyannavar , Sandesh Doddamane Ramappa , Dean C. Hruzek , Michael R. Rice , Jeffrey A. Brodine
IPC: H01L21/67 , H01L21/673 , H01L21/677
Abstract: An equipment front end module (EFEM) includes sidewalls forming an EFEM chamber configured to receive inert gas from an inert gas supply. The sidewalls include a first sidewall configured to attach to a panel first side of a panel. The panel forms a panel opening extending between the panel first side and a panel second side. The panel second side is configured to attach to a side storage pod. The EFEM further includes a robot disposed in the EFEM chamber. The robot is configured to transfer substrates from the EFEM chamber into the side storage pod via the panel opening. An exhaust conduit is coupled to the side storage pod to exhaust gas from the side storage pod to an exterior of the side storage pod.
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公开(公告)号:US20200024735A1
公开(公告)日:2020-01-23
申请号:US16204655
申请日:2018-11-29
Applicant: Applied Materials, Inc.
Inventor: Xiaowei Wu , Jennifer Y. Sun , Michael R. Rice
IPC: C23C16/455 , C23C16/30
Abstract: Embodiments of the present disclosure relate to articles, coated articles and methods of coating such articles with a rare earth metal containing fluoride coating. The coating can contain at least a first metal (e.g., a rare earth metal, tantalum, zirconium, etc.) and a second metal that have been co-deposited onto a surface of the article. The coating can include a homogenous mixture of the first metal and the second metal and does not contain mechanical segregation between layers in the coating.
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公开(公告)号:US10443125B2
公开(公告)日:2019-10-15
申请号:US15965812
申请日:2018-04-27
Applicant: Applied Materials, Inc.
Inventor: Xiaowei Wu , David Fenwick , Guodong Zhan , Jennifer Y. Sun , Michael R. Rice
IPC: C23C4/11 , C23C16/28 , H01J37/32 , C23C16/452 , C23C16/40 , C23C16/455 , C23C4/134 , C23C4/18 , C23C14/08 , C23C14/22 , C23C14/58 , C23C16/56 , C23C28/04 , C23C28/00 , C23C16/30 , C23C16/44
Abstract: An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
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