发明授权
- 专利标题: Semiconductor device and method of forming double-sided fan-out wafer level package
-
申请号: US16570049申请日: 2019-09-13
-
公开(公告)号: US11127668B2公开(公告)日: 2021-09-21
- 发明人: Il Kwon Shim , Pandi C. Marimuthu , Won Kyoung Choi , Sze Ping Goh , Jose A. Caparas
- 申请人: JCET Semiconductor (Shaoxing) Co., Ltd.
- 申请人地址: CN Shaoxing
- 专利权人: JCET Semiconductor (Shaoxing) Co., Ltd.
- 当前专利权人: JCET Semiconductor (Shaoxing) Co., Ltd.
- 当前专利权人地址: CN Shaoxing
- 代理机构: Patent Law Group: Atkins and Associates, P.C.
- 代理商 Brian M. Kaufman; Robert D. Atkins
- 主分类号: H01L21/56
- IPC分类号: H01L21/56 ; H01L23/31 ; H01L23/538 ; H01L23/498 ; H01L23/00 ; H01L25/10
摘要:
A semiconductor device comprises a first semiconductor package including a conductive layer. A substrate including an interconnect structure is disposed over the conductive layer. The interconnect structure of the substrate with the conductive layer of the first semiconductor package are self-aligned. A plurality of openings is formed in the substrate. An adhesive is disposed between the substrate and the first semiconductor package and in the openings of the substrate. A redistribution layer (RDL) is formed over the first semiconductor package opposite the substrate. A pitch of the substrate is different from a pitch of the RDL. The adhesive extends to the interconnect structure of the substrate. A second semiconductor package is disposed over the substrate and the first semiconductor package.
公开/授权文献
信息查询
IPC分类: