Invention Grant
- Patent Title: Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device
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Application No.: US16820849Application Date: 2020-03-17
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Publication No.: US11145429B2Publication Date: 2021-10-12
- Inventor: Atsushi Ueda , Gota Niimi , Georg Soumagne
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JPJP2019-070021 20190401
- Main IPC: G21K1/06
- IPC: G21K1/06 ; G02B5/08 ; G02B5/10 ; H05G2/00 ; G02B27/00 ; G03F7/20
Abstract:
An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
Public/Granted literature
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