公开(公告)号：US11940736B2

公开(公告)日：2024-03-26

申请号：US17398054

申请日：2021-08-10

Applicant: Gigaphoton Inc.

Inventor： Gota Niimi ,  Yoshifumi Ueno ,  Shinji Nagai

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/006

Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

公开(公告)号：US11145429B2

公开(公告)日：2021-10-12

申请号：US16820849

申请日：2020-03-17

Applicant: Gigaphoton Inc.

Inventor： Atsushi Ueda ,  Gota Niimi ,  Georg Soumagne

IPC: G21K1/06 ,  G02B5/08 ,  G02B5/10 ,  H05G2/00 ,  G02B27/00 ,  G03F7/20

Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.