Invention Grant
- Patent Title: Method for optical proximity correction in which consistency is maintained and method for manufacturing mask using the same
-
Application No.: US16855083Application Date: 2020-04-22
-
Publication No.: US11150551B2Publication Date: 2021-10-19
- Inventor: Heungsuk Oh , Joobyoung Kim , Sanghun Kim , Guk Hyun Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0141095 20191106
- Main IPC: G06F30/392
- IPC: G06F30/392 ; G03F1/36

Abstract:
A computer-readable medium includes a program code that, when executed by a processing circuitry, causes the processing circuitry to divide a layout of a semiconductor chip into a plurality of patches, generate a plurality of segments from a layout of each of the plurality of patches, wherein a first patch of the plurality of patches includes first segments and a second patch of the plurality of patches includes second segments, calculate hash values respectively corresponding to the first segments and the second segments by using a hash function, calculate bias values of segments having a first hash value from among the first segments, calculate a representative value based on the bias values, and apply the representative value to the segments having the first hash value from among the first segments.
Public/Granted literature
Information query